Corrosion Resistant Silicon Coatings for Improved Semiconductor Manufacturing

Application Benefits

Etch: – Eliminate ion contamination in corrosive etch gas streams Atomic Layer Deposition (ALD): – Maintain ultimate purity by coating exposed surfaces of all chambers and equipment. Reduces carryover and corrosion Epitaxy: – Significantly reduce contamination and maintenance caused by corrosion Ozone: – Stabilize flow path to assure ozone purity Gas Transfer – Prevent ion contamination, assure high purity of gases, eliminate surface reaction Chemical-Mechanical Planarization (CMP): Increase lubricity, prevent sticking and cut downtime

Data - The Proof is in the Performance

Dramatically increase system lifetime without failure by coating gas delivery systems with our corrosion resistant, amorphous silicon-based coatings. 

Improve yields by completely shielding metal equipment from the process stream with an ultra-thin (<1µm), inert silicon coating that substantially outperforms yttria and other ceramic coatings.

Want to learn more?  Click below to download our presentation from ASMC 2017 to get a comprehensive overview of our coating technology and solutions for semiconductor manufacturing applications.